Goingtomeet.com: SPIE Photomask Technology 2008

SPIE Photomask Technology 2008

"Lithography"

Oct 06, 2008 - Oct 10, 2008
Monterey Marriott and Monterey Conference Center Monterey, California United States

Highlights: The Annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. This year's four-day symposium will give you the chance to engage with the most up-to-date research on emerging and on-going issues facing the photomask industry in advanced lithography and their manufacturing and data solutions. With the deep sub-wavelength era upon us, the industry's progress will depend on the successful integration and optimization of design, maskmaking, and wafer fabrication.
Help solve the most pressing issues in:
• Mask Infrastructure
• Mask Integration
• Emerging Mask Technology
• Mask Business

Contact Details: Contact person: Customer Service; Email address:; Event website: http://spie.org/photomask.xml?WT.mc_id=RCALENDARW; Phone: +1 360 676 3290

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